Japanese Government Procurement
National University Corporation - Notice of request for submission of materialsELECTRON-BEAM LITHOGRAPHY SYSTEM FOR NANOSCALE INTEGRATION 1 SET
This procurement is covered by the WTO Agreement on Government Procurement, Japan-EU Economic Partnership Agreement or Japan-UK Comprehensive Economic Partnership Agreement.
| Publishing date | Nov 01, 2016 |
|---|---|
| Type of notice | Notice of request for submission of materials |
| Procurement entity | National University Corporation - Miyagi |
| Classification |
0024 Professional/Scientific & Controlling Instruments & Apparatus |
| Summay of notice | 6 Summary (1) Classification of the products to be procured : 24 (2) Nature and quantity of theproducts to be purchased : Electron-beam Lithography Systemfor Nanoscale Integration 1 Set (3) Type of the procurement :Purchase (4) Basic requirements of theprocurement : 〓The electron-beam lithographysystem for nanoscale integration has to have following functions. 1 )Acceleration voltage ofelectron-beam should be 100 kV or more. 2 )Electron-beam should befocused to spot-beam diameter of less than 5 nm. 3 )Scanning method ofelectron-beam should be vector scan method. 4 )Scanning speed ofelectron-beam should be 100 MHz or more. 5 )The electron-beam lithographysystem should have a function in which a series of operation fromtransfer of a 300 mm wafer to electron-beam lithography can beperformed automatically. (5) Time limit for the submissionof the requested material : 17 : 00 2 December, 2016 (6) Contact point for the notice : Hirotaka Kikuchi, ProcurementServices Office, Finance Department, Tohoku University,2-1-1 Katahira Aoba-ku Sendai-shi 980-8577 Japan, TEL 022-217-4869 |
