OSAKA INDUSTRY SEMINAR:
Corporate Growth Opportunities
Osaka is located in the heart of the Kansai Region in Japan and the region’s economic output is equivalent to that of South Korea’s GDP. Osaka previously served as the capital of Japan and, for centuries, functioned as a pivotal port of entry for international exchange. In more modern times, it has been a bastion of commerce and finance, and played a major role in Japan’s industrial and economic development.
Osaka and its surrounding regions are home to a cluster of highly skilled manufacturers of batteries and battery-related components and devices. Furthermore, many research institutes such as universities and technology accelerators that support these manufacturers in R&D are easily assessable in close proximity.
In this upcoming event, Mr. Ichiro Matsui, Governor of Osaka will highlight the powerful energy related clusters, innovations and the market potentials in Osaka. Also Mr. Shinya Fujii, Director-General of JETRO Osaka will share insights on the business opportunities for Canadian companies entering the Japanese market and outline the JETRO services available to support Canadian companies.
Osaka Prefectural Government
Consulate General of Japan in Toronto
Global Affairs Canada
Date: September 15th, 2016
Time: 14:00 - 15:30
Location: Torys LLP, 79 Wellington St. West, 33rd floor, TD South Tower, Toronto, ON M5K 1N2
13:30-14:00 pm: Registration
14:00–14:10 pm: Opening Remarks
- Ichiro Matsui, Governor of Osaka Prefecture
- Kazuo Nakamura, Executive Director, JETRO Toronto
14:10–14:20 pm: Guest Remarks
- Ontario Government (TBC)
- Yasunori Nakayama, Consul General of Japan in Toronto
- Ichiro Matsui, Governor of Osaka Prefecture, “Osaka’s High-Tech Clusters and Market Potentials”
Osaka Governor PowerPoint
- Shinya Fujii, Director-General, JETRO Osaka, “Investment Climate in Japan/Kansai and Business Opportunities for Canadian Companies”
JETRO Osaka PowerPoint
15:20 pm: Closing & Networking
Please note that this event is free but pre-registration is required at.