IESD 2025 - International Exhibition on Surfactant & Detergent

Date April 23, 2025 - April 25, 2025
Location Shanghai / China / Asia
Venue Shanghai Convention & Exhibition Center of International Sourcing
Expected floor size ：8,000 sq.m.
Items to be exhibited Ionic surfactant, Non-ionic surfactant, New green surfactant, Detergent, polyether, sodium metasilicate, sodium carbonate, sodium sulfate, brightener, enzyme, decolorizer, softener, slipping agent, oxidizing agent, adsorbent, cleaning materials and their intermediates, Analytical testing instruments, quality control and daily chemical product packaging technology, materials and mechanical equipment, other research results, patented technology
For Visitors Eligibility : Trade only
Method of admission : Apply/register online / Registration/tickets available at event
For details, please contact the organizer directly.
Organizer Shanghai Yihan Exhibition Service Co., Ltd.
Address : Rm. 1206, Seat 17, NO.1588, Modern Industrial Park, Youyi Road, Shanghai, (200110) China
Person : Norman Zhou
Tel : +86-15162480012
E-mail : cihexpo@aliyun.com
Message from organizer The largest professional exhibition in the field of surfactants and detergents in China
Industry
Frequency Annual
last fair information 2024 year
Total number of visitors : 12000
Total number of exhibitors : 183
Expected floor size : 16,000 sq.m.
The past records may include concurrent/joint exhibits.
Official website For more detailed information of the trade fair, please check the official website External site: a new window will open. of the individual organizer.
last update March 18, 2025

Japanese

A modal window will open.
A modal window will open.
A modal window will open.

Information contained herein are subject to amendment, postponement and cancellation by the organizer at any time without notice.
For more detailed information on each event, please check the official website of its organizer. JETRO shall not be responsible for any loss or inconvenience caused by actions taken based the information within J-messe.