Online Trade Fair Database (J-messe)
IESD China 2020 - 2020 International Exhibition on Surfactant & Detergent
|Date||May 13, 2020 - May 15, 2020|
|City / Country||Shanghai / China / Asia|
Shanghai Convention & Exhibition Center of International Sourcing
|Items to be exhibited||Ionic surfactants, non-ionic surfactants, zwitterionic surfactants, new, green surfactants, corporate image of ethylene oxide and its derivatives, alkylbenzene (AB), ethylene oxide (EO) , Propylene oxide (PO), nonylphenol (NP), octylphenol (OP), ethylene glycol (EG), ethanolamine, polyethylene, glycol(PEG), ethyleneamine(EA), fatty acids, fatty alcohols, fatty amines, fatty acid methyl esters, detergents, personal and home care products, analytical testing equipment, quality control, packaging technology for daily chemical products, materials and machinery, other surfactants, Detergent and various surfactants, detergent research results, patented technology|
Eligibility : Trade only
Method of admission : Apply/register online
For details, please contact the organizer directly.
Shanghai Yihan Exhibition Service Co., Ltd.
Tel : +86-21-33793223
E-mail : firstname.lastname@example.org
|last fair information||
Total number of visitors : 6013
Total number of exhibitors : 163
The past records may include concurrent/joint exhibits.
|Official website||For more detailed information of the trade fair, please check the official website of the individual organizer.|
|last update||December 27, 2019|
Please choose one of the following feedbacks for an improvement in quality of JETRO's "J-messe".
Thank you for your cooperation.
Please choose the degree of usefulness.
Failed register the evaluation.
It is an article that has already been evaluated.
It can not be evaluated.
Information contained herein are subject to amendment, postponement and cancellation by the organizer at any time without notice.
For more detailed information on each event, please check the official website of its organizer. JETRO shall not be responsible for any loss or inconvenience caused by actions taken based the information within J-messe.